MOCVD Susceptor nrog TaC Txheej

Hauv cov txheej txheem loj hlob ntawm semiconductor epitaxial raws li MOCVD, lub substrate ua haujlwm ua ib qho tseem ceeb ntawm cov txheej txheem, txiav txim siab ncaj qha rau cov xwm txheej thermodynamic thiab tshuaj lom neeg ciam teb hauv qab lub wafer. Semixlab's MOCVD Susceptor nrog TaC Coating yog tsim tshwj xeeb rau cov chaw loj hlob epitaxial, ua tau raws li qhov xav tau nruj rau kev ruaj khov ntawm cov khoom siv epitaxial uas tsim los ntawm qhov kub thiab txias siab heev, cov tshuaj lom neeg ua ntej corrosive, thiab cov voj voog ntau lawm ntev. Los ntawm kev sib xyaw ua ke ntawm cov txheej txheem tantalum carbide CVD-deposited nrog cov qauv substrate-machined precision, cov khoom no muab qhov ruaj khov, tiv taus kev ua qias tuaj uas txhawb nqa kev loj hlob epitaxial txhim khu kev qha nyob rau hauv cov txheej txheem xav tau tshaj plaws.

Hauv MOCVD reactors, TaC txheej ua lub luag haujlwm tseem ceeb hauv kev tswj hwm qhov chaw thiab thermal stability, feem ntau ua haujlwm saum 1200 ° C thiab tej zaum yuav mus txog qhov txwv siab tshaj plaws ntawm cov ntaub ntawv txheej txheem ib txwm muaj. Nrog lub ntsiab lus yaj tshaj 3880 ° C thiab kev tsis muaj zog tshuaj lom neeg tshwj xeeb, tantalum carbide tiv taus kev puas tsuaj hauv hydrogen, ammonia, thiab hlau-organic ib puag ncig uas yog ib txwm muaj ntawm kev loj hlob ntawm cov khoom sib xyaw ua ke. Qhov kev ruaj khov tshuaj lom neeg no txo ​​qhov xeb ntawm txheej thiab tiv thaiv cov khoom tawm hauv substrate, yog li txo cov khoom me me thiab tswj hwm ib puag ncig kev loj hlob huv si - tseem ceeb rau kev ua tiav cov txheej epitaxial qis-qhov tsis zoo.

Los ntawm kev saib xyuas kev tswj cua sov, TaC Coating Susceptor pab txhawb kev hloov pauv cua sov uas kwv yees tau thiab ruaj khov hauv thaj chaw epitaxial. Qhov chaw tantalum carbide tswj tau qhov emissivity thiab cov yam ntxwv hluav taws xob thaum lub sijhawm ua haujlwm kub ntev, ua rau muaj kev tswj hwm qhov kub ntawm wafer thiab txhim kho qhov rov ua dua ntawm ntau qhov. Qhov kev ruaj khov no yog qhov tseem ceeb heev hauv cov txheej txheem loj hlob epitaxial, qhov twg qhov kub thiab txias me me tuaj yeem ua rau muaj kev hloov pauv tseem ceeb hauv cov tuab ntawm txheej, cov khoom sib xyaw, lossis kev koom ua ke ntawm dopant.

Hauv cov ntawv thov semiconductor, TaC-coated MOCVD susceptors yog siv dav rau GaN-based LED epitaxial kev loj hlob, qhov twg qhov kub siab thiab cov roj ammonia siab ua rau muaj kev cov nyom loj rau cov ntaub ntawv substrate. Cov txheej txheem tantalum carbide ntom ntom zoo tiv taus kev raug cov pa roj corrosive ntev thaum tswj hwm qhov du, hnav-resistant nto. Qhov no pab txo cov khoom tawg thiab txhim kho wafer uniformity. Tsis tas li ntawd, TaC-coated substrates txhawb nqa MOCVD txheej txheem kev txhim kho thiab kev sim ntau lawm ib puag ncig. Lawv qhov kev tiv thaiv thermal shock tshwj xeeb thiab kev tiv thaiv tshuaj corrosion ua rau lawv tiv taus qhov kub thiab txias hloov pauv thiab cov txheej txheem parameter hloov kho yam tsis muaj kev cuam tshuam rau kev ncaj ncees ntawm txheej. Qhov no ua rau kev txhim kho cov txheej txheem txhim khu kev qha thiab kev hloov pauv thev naus laus zis du los ntawm R&D mus rau kev tsim khoom loj. Thoob plaws lub neej ntawm cov khoom, qhov ruaj khov ntawm TaC coatings ntev lub voj voog txij nkawm tiv thaiv, txo cov khoom siv tsis tau npaj tseg, thiab txo tag nrho cov nqi ntawm kev muaj.

Ua ib lub tuam txhab thev naus laus zis ua lag luam hauv Suav teb cov txheej txheem semiconductor epitaxial, Semeixab cog lus tias yuav muab cov thev naus laus zis siab heev thiab kev kho kom haum rau Tantalum Carbide Coating MOCVD Susceptor rau kev lag luam semiconductor. Peb tuaj yeem phim cov khoom nrog cov haujlwm thiab cov qauv sib xws rau koj cov kev xav tau tshwj xeeb, kom ntseeg tau tias kev ua haujlwm zoo ntawm koj cov khoom. Semeixab tos ntsoov yuav los ua koj tus khub mus sij hawm ntev hauv Suav teb.