CVD SiC Txheej Qab nthab

Hauv cov txheej txheem semiconductor epitaxy (EPI), tshwj xeeb tshaj yog silicon epitaxy thiab silicon carbide epitaxy, cov khoom qab nthab raug rau kev kub hnyiab heev, cov chaw hydrogen uas muaj cov tshuaj hydrogen ntau, thiab cov tshuaj chlorine uas muaj cov tshuaj precursors. Cov txheej txheem CVD SiC muaj cov tshuaj lom neeg tsis muaj zog thiab kev ruaj khov thermal, zoo cais cov qauv chamber los ntawm cov pa roj corrosive thaum txo cov khoom me me. Lawv cov qauv microstructure uas ntom thiab huv siab tiv thaiv cov hlau ua qias tuaj thiab tiv thaiv kev puas tsuaj ntawm cov txheej txheem thaum lub sijhawm tsim khoom ntev, txhawb nqa ncaj qha rau kev loj hlob ntawm cov txheej txheem epitaxial, kev sib xyaw ua ke ntawm cov tshuaj dopant ruaj khov, thiab qhov ceev tsis zoo.

Hauv cov txheej txheem CVD deposition xws li LPCVD thiab PECVD, lub qab nthab ntawm chav ua lub luag haujlwm tseem ceeb hauv kev tswj kom muaj chaw ruaj khov thaum lub sijhawm rov ua dua thiab ntxuav. Yog tias tsis yog, cov khoom lag luam thiab cov zaj duab xis tso rau ntawm qhov chaw ntawm chav tuaj yeem cuam tshuam rau kev sib phim ntawm cov khoom siv thiab kev ua haujlwm rov ua dua. CVD SiC coatings qhia txog kev sib txuas tsawg rau cov zaj duab xis tso thiab kev kam rau siab zoo rau cov tshuaj ntxuav fluorine- thiab chlorine, ua rau kev ntxuav hauv qhov chaw zoo thiab txo qhov delamination. Yog li ntawd, qhov sib xws ntawm cov zaj duab xis tuab, kev ua haujlwm rov ua dua, thiab lub sijhawm ua haujlwm ntawm cov khoom siv tau txhim kho ntau heev, tshwj xeeb tshaj yog nyob rau hauv cov chaw tsim khoom ntau.

Semixlab's CVD SiC Coating Ceiling muab cov txheej txheem siab ceev, qhov roughness ntawm qhov chaw tswj tau, thiab kev nplaum zoo rau lub substrate. Kev sib raug zoo ntawm kev nthuav dav thermal ntawm SiC txheej thiab graphite substrate ua kom muaj kev ruaj khov ntawm cov khoom siv hauv qab kev hloov pauv thermal sai, txo qhov kev pheej hmoo ntawm kev tawg lossis delamination.

Piv rau cov khoom siv quartz lossis oxide ib txwm muaj, CVD SiC ua rau muaj kev kam rau siab rau plasma etching thiab hydrogen etching, ncaj qha txuas ntxiv lub sijhawm txij nkawm tiv thaiv thiab txo tag nrho cov nqi ntawm kev muaj. Lub CVD SiC Coating Ceiling no yog tsim los rau kev sib raug zoo nrog cov khoom siv semiconductor, xyuas kom meej tias muaj kev sib xws ntawm cov chambers thiab thoob plaws cov khoom siv - tseem ceeb rau cov txheej txheem siab heev thiab cov kab ntau lawm.

Ua ib lub tuam txhab thev naus laus zis ua lag luam hauv Suav teb cov txheej txheem semiconductor epitaxial, Semeixab cog lus tias yuav muab cov thev naus laus zis siab heev thiab cov kev daws teeb meem khoom CVD SiC Coating Ceiling rau kev lag luam semiconductor. Peb tuaj yeem phim cov haujlwm thiab cov qauv ntawm peb cov khoom rau koj cov kev xav tau tshwj xeeb, kom ntseeg tau tias kev ua haujlwm zoo ntawm koj lub tuam txhab tsim khoom. Semeixab tos ntsoov yuav los ua koj tus khub mus sij hawm ntev hauv Suav teb.