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SiC Coated ICP Etching Susceptor
Lub SiC Coated ICP Etching Susceptor yog ib qho khoom siv wafer txhawb nqa uas ua tau zoo heev uas tsim los rau ICP plasma etching daim ntawv thov hauv kev tsim khoom semiconductor siab heev. Ua los ntawm cov khoom siv semiconductor-qib isostatic graphite substrate uas muaj qhov huv siab thiab tiv thaiv los ntawm cov txheej SiC tuab, nws muab cov plasma tiv thaiv zoo heev, kev ruaj khov thermal, thiab kev tswj hwm kev ua qias tuaj hauv cov chaw etching siab, muaj zog siab. Los ntawm kev ua kom muaj kev hloov pauv cua sov sib xws, kev tso wafer ruaj khov, thiab kev ruaj khov ntev ntev tiv thaiv cov tshuaj lom neeg halogen, lub susceptor no txhawb nqa kev ua haujlwm zoo dua, lub neej ntev ntawm cov khoom, thiab txo tus nqi ntawm kev muaj rau cov txheej txheem etching ICP niaj hnub. Peb tos ntsoov yuav tau txais koj cov lus nug.
Hauj lwm
Lub SiC Coated ICP Etching Susceptor yog ib qho tseem ceeb plasma contact component tshwj xeeb uas tau tsim tshwj xeeb rau cov txheej txheem etching ICP (Inductively Coupled Plasma) hauv kev tsim khoom semiconductor. Hauv qhov chaw plasma siab-density qhov twg cov txheej txheem ruaj khov, thermal uniformity, thiab kev tswj hwm kev ua qias tuaj ncaj qha txiav txim siab qhov txiaj ntsig thiab kev ua haujlwm ntawm lub cuab yeej, lub graphite susceptor ua haujlwm ua lub hauv paus tseem ceeb ntawm wafer, plasma, thiab thermal management system.
Cov khoom siv Semixlab Susceptors siv cov khoom siv graphite semiconductor-qib isostatic siab uas muaj cov txheej txheem silicon carbide tuab. Cov qauv no ua ke cov thermal conductivity thiab machinability zoo tshaj plaws ntawm graphite nrog SiC qhov kev tiv thaiv plasma corrosion zoo tshaj plaws thiab kev tsis muaj tshuaj lom neeg. Cov tshuaj daws teeb meem muaj zog tiv taus lub zog RF siab, cov tshuaj lom neeg corrosive halide, thiab kev tawm tsam ion ntau hauv cov txheej txheem ICP etching.
Hauv ICP etch chamber, lub graphite susceptor ua lub luag haujlwm tseem ceeb hauv kev tso wafer, kev tswj kub, thiab kev ua cov txheej txheem rov ua dua. Nws muab kev txhawb nqa tshuab tseeb rau wafers thaum ua kom muaj kev hloov pauv cua sov zoo los txhawb kev txias helium tom qab thiab kev tswj kub ruaj khov. Kev coj tus cwj pwm thermal sib xws thoob plaws qhov chaw wafer yog qhov tseem ceeb rau kev tswj hwm cov nqi etch sib xws, qhov tseem ceeb ntawm qhov ntev (CD) sib xws, thiab kev tswj hwm profile - tshwj xeeb tshaj yog nyob rau hauv qhov sib piv siab thiab anisotropic etching daim ntawv thov. Lub txheej SiC txo qhov kev hloov pauv kub hauv zos thiab txo qhov kev puas tsuaj los ntawm plasma.
Los ntawm qhov kev xav ntawm kev sib cuam tshuam ntawm cov plasma, SiC txheej ua haujlwm ua ib qho kev thaiv ruaj khov tiv thaiv cov plasmas fluorine- thiab chlorine-based uas feem ntau siv rau kev txiav silicon, dielectrics, thiab cov ntaub ntawv dav dav. Piv rau cov graphite tsis muaj txheej lossis cov ntaub ntawv ceramic ib txwm muaj, nws qhov kev xeb tsawg thiab kev tiv taus siab rau micro-arcing ua rau lub neej ntawm cov khoom siv ntev dua. Tib lub sijhawm, cov txheej SiC ntom ntom tiv thaiv kev tsim cov khoom me me thiab kev ua qias tuaj ntawm cov hlau, ua tau raws li qhov yuav tsum tau ua kom huv si hauv cov chaw tsim khoom semiconductor siab heev thaum txhawb nqa lub sijhawm ua haujlwm ntawm cov khoom siv thiab lub sijhawm nruab nrab ntawm kev ua tsis tiav (MTBF).
Lub SiC Coated ICP Etching Susceptor qhia txog Semixlab Technology txoj kev nkag siab tob txog plasma etching physics, cov khoom siv engineering, thiab cov kev cai tsim khoom semiconductor. Los ntawm kev koom ua ke cov Graphite Susceptors purity siab nrog cov thev naus laus zis SiC Coating siab heev, Silicon Carbide Coated ICP Etching Susceptor muab cov kev daws teeb meem sib npaug uas ua rau cov txheej txheem ruaj khov, ntev lub neej ntawm cov khoom, thiab txhawb nqa kev nce qib tas mus li ntawm ICP etching technology.
Ua ib lub tuam txhab ua khoom siv SiC-coated ICP etching susceptors hauv Suav teb, Semixlab cog lus tias yuav muab kev sab laj txog kev siv tshuab thiab kev daws teeb meem khoom rau kev lag luam semiconductor etching. Peb tos ntsoov yuav los ua koj tus khub mus sij hawm ntev hauv Suav teb.
Specifications
| Cov yam ntxwv ntawm lub cev ntawm CVD SiC txheej | |
| Khoom | Tus Nqi Qub |
| Crystal Structure | FCC β theem polycrystalline, feem ntau (111) taw qhia |
| ceev | 3.21 g / cm³ |
| Hardness | 2500 Vickers hardness (500g load) |
| Nthuav Loj | 2 ~ 10μm |
| Tshuaj Purity | 99.99995% |
| Peev Xwm Kub | 640 XNUMXj kg-1· K-1 |
| Sublimation kub | 2700 ℃ |
| Kev Ua Tau Zoo | 415 MPa RT 4-point |
| Young's Modulus | 430 Gpa 4pt khoov, 1300 ℃ |
| Thermal Kev Coj Ua | 300 Wm-1· K-1 |
| Thermal Expansion (CTE) | 4.5 × 10-6K-1 |
peb pab
Semixlab khoom khw
