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Tantalum Carbide Coated Crucible
Semixlab’s Tantalum Carbide (TaC) Coated Crucible is specially designed for high-temperature and chemically aggressive environments in semiconductor processing. Engineered with a dense CVD TaC coating, the crucible offers outstanding thermal resistance, corrosion protection, and structural stability, making it ideal for SiC epitaxy, GaN growth, and CVD/ALD applications. Enhance your process reliability and reduce contamination risks with our premium crucible technology.
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Cov Kev Pabcuam Semixlab
At Semixlab, we understand the unique requirements of semiconductor R&D and production environments. We offer:
● Custom Fabrication Services
Tailor-made crucibles in various geometries, thicknesses, and coating specifications to match specific process needs.
● Small-Batch & Prototype Orders
Flexible order quantities ideal for pilot lines, academic research, or early-stage development.
● Fast Lead Times & Global Delivery
Rapid production cycles and worldwide shipping support your schedule and scale-up needs.
Specifications
| Lub cev muaj zog ntawm TaC txheej | |
| ceev | 14.3 (g / cm³) |
| Tshwj xeeb emissivity | 0.3 |
| Thermal expansion coefficient | 6.3*10-6/K |
| Hardness (HK) | 2000 HK ib |
| Kuj | 1 × 10-5 Aw* cm |
| Thermal ruaj khov | <2500 ℃ |
| Graphite loj hloov | -10 ~ 20 hli |
| Txheej thickness | ≥20um tus nqi raug (35um ± 10um) |
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Combining the unique physical advantages of tac coatings with the excellent properties of premium graphite, our Tantalum Carbide Coated Crucible is mainly used in the following semiconductor processes:
▶ MOCVD & HVPE Crucible Systems
▶ Epitaxial Growth of SiC, GaN, GaAs
▶ High-Temperature Annealing & Melting
▶ Advanced Wafer Fabrication Equipment
Semixlab TaC Coated Crucible plays a critical role in advanced semiconductor manufacturing, particularly in processes requiring ultra-high temperature stability, minimal contamination, and chemical resistance—such as epitaxy, crystal growth, and chemical vapor deposition (CVD). By providing a chemically inert barrier and exceptional thermal resilience, TaC-coated crucibles ensure process integrity, material purity, and equipment longevity across various high-demand fabrication steps.
With customizable dimensions, coating thickness, and small-batch support, Semixlab provides tailored solutions to meet the demands of advanced semiconductor manufacturing. We sincerely hope to become your long-term partner in China.
Kev Tshaj Loj (Competitive Advantage)
Key Advantages: The Physical Properties of Tantalum Carbide
Tantalum Carbide (TaC) is known for its ultra-high melting point (~3880°C), exceptional hardness, and chemical inertness—making it an ideal protective coating for graphite crucibles used in semiconductor environments. The application of TaC coating brings the following performance benefits:
● Extreme Thermal Resistance
Withstand ultra-high temperatures without deformation or degradation, enabling stable conditions for crystal growth and high-temperature processing.
● Chemical Inertness
Resistant to aggressive halogen-based gases and acids typically used in epitaxy and etching processes, preventing cross-contamination.
● Minimal Particle Generation
The dense, smooth surface of the TaC layer suppresses flaking and particle shedding, ensuring low defect rates in cleanroom environments.
● Kev Ua Kub Zoo heev
Ensures uniform heat distribution during material processing, improving yield and consistency.
Base Materials from Leading Suppliers
Our crucibles are manufactured using high-purity graphite substrates sourced from top-tier suppliers such as TOYO TANSO (Japan), ensuring structural integrity and coating compatibility. The synergy between premium graphite and advanced TaC coating enhances both durability and performance under the most demanding conditions.
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Semixlab khoom khw
