TaC coated graphite nplhaib
TaC Coated Graphite Rings from Semixlab are engineered for extreme performance in semiconductor manufacturing. Our high-purity Tantalum Carbide (TaC) CVD coating rings are indispensable for CVD, PVD, and plasma etching processes, serving as guide rings, focus rings, and liner rings. Reduce particle contamination and enhance wafer yield with our durable and reliable components.
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Semixlab TaC Coated Graphite Ring is a critical component used primarily within semiconductor manufacturing equipment. It consists of a high-purity graphite substrate meticulously coated with a layer of Tantalum Carbide (TaC). This advanced coating provides a superior surface that protects the underlying graphite from harsh chemical environments and high-temperature conditions.
Our TaC Coated Graphite Rings are instrumental in processes like Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and plasma etching. They serve as a protective barrier, a guide ring, or a key structural part in the reaction chamber, ensuring the integrity and quality of the final semiconductor wafer.
Specifications
| Physical properties of Tantalum Carbide (TaC) Coating | |
| ceev | 14.3 (g / cm³) |
| Tshwj xeeb emissivity | 0.3 |
| Thermal expansion coefficient | 6.3*10-6/K |
| Hardness (HK) | 2000 HK ib |
| Kuj | 1 × 10-5 Aw* cm |
| Thermal ruaj khov | <2500 ℃ |
| Graphite loj hloov | -10 ~ 20 hli |
| Txheej thickness | ≥20um tus nqi raug (35um ± 10um) |
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Kev siv hauv cov txheej txheem semiconductor
The robust properties of our TaC Coated Graphite Rings for Semiconductor manufacturing make them indispensable in several key applications.
1. Chemical Vapor Deposition (CVD)
In CVD processes, where gases are reacted at high temperatures to deposit thin films on wafers, the reaction chamber is a highly aggressive environment. Our CVD TaC coated rings are used as susceptor rings, guide rings, and liner rings. They provide exceptional protection against corrosive gases and chemical attacks, preventing particle contamination and ensuring uniform film thickness across the wafer. The high thermal stability of TaC allows for stable operation even at extreme temperatures.
2. Lub cev Vapor Deposition (PVD)
For PVD sputtering and e-beam evaporation, our rings serve as essential components within the vacuum chamber. They act as shielding rings or guide rings that protect other sensitive parts from sputtering debris and plasma bombardment. The extraordinary hardness and density of the TaC coating make it highly resistant to particle erosion, drastically reducing the risk of component degradation and subsequent wafer defects.
3. Plasma Etching
During plasma etching, a highly reactive plasma is used to selectively remove material from the wafer. This process subjects components
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Advantages of Semixlab TaC Coated Graphite Rings
1. Superior Durability
●Dense CVD TaC coating resists plasma, chemical attack, and mechanical wear far better than bare graphite.
2. High Purity for Semiconductor Yield
●Manufactured with ultra-low impurity graphite and high-purity TaC coating to minimize ionic contamination.
3. Precision Machining & Coating Control
●Advanced machining for tight tolerances; uniform coating thickness for consistent performance.
4. Customization & Engineering Support
●Options for different diameters, cross-sectional profiles, coating thicknesses, and sealing features.
●Technical consultation for process-specific designs.
5. Fast Prototyping & Global Supply
●Rapid sample production, global logistics, and reliable lead times.
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