TaC coated wafer chuck

Cov khoom siv wafer uas muaj txheej txheem TaC ntawm Semixlab ua haujlwm ua cov khoom tseem ceeb rau cov txheej txheem loj hlob ntawm silicon carbide (SiC) epitaxial, qhov twg kev vam meej nyob ntawm kev tiv taus qhov kub thiab txias heev, cov tshuaj lom neeg corrosive, thiab kev ua haujlwm nruj heev. Tsim los rau kev ua kom ruaj khov, kev huv, thiab kev ua haujlwm rov ua dua, Semixlab cov khoom siv wafer TaC txhawb nqa kev tsim khoom SiC siab los ntawm kev txhim kho epitaxial uniformity, txuas ntxiv lub sijhawm txij nkawm, thiab nce lub sijhawm ua haujlwm ntawm cov khoom siv hauv cov chaw tsim khoom ntau.

Ua los ntawm cov khoom siv graphite uas muaj purity siab thiab ua kom raug los xyuas kom meej tias nws tiaj tus, sib npaug, thiab ruaj khov nyob rau hauv qhov kub thiab txias, lub substrate no tau coated nrog ib txheej tantalum carbide (TaC) uas tuab thiab purity siab. Qhov no tsim ib qho chaw uas tsis muaj tshuaj lom neeg, tiv taus cua sov uas raug rau SiC wafers thiab cov txheej txheem reactive. Tantalum carbide yog cov khoom siv ceramic ruaj khov tshaj plaws hauv kev tsim khoom semiconductor, uas muaj qhov kub yaj tshaj 3880 ° C thiab tiv taus hydrogen, halogen-muaj gases, thiab silicon vapors uas feem ntau muaj nyob rau hauv SiC CVD thiab cov txheej txheem epitaxial kub siab.

Hauv SiC epitaxy reactors, TaC-coated wafer holders ua lub luag haujlwm tseem ceeb hauv kev tswj hwm qhov kub thiab txias ntawm thaj chaw loj hlob. SiC epitaxy feem ntau tshwm sim ntawm qhov kub tshaj 1600 ° C, qhov twg txawm tias qhov kub thiab txias me me tuaj yeem ua rau muaj kev loj hlob tsis sib xws, kev hloov pauv dopant, lossis cov teeb meem crystalline zoo li stacking faults. TaC txheej tswj hwm qhov chaw ruaj khov thaum lub sijhawm kub ntev, tiv thaiv kev xeb, microcracks, lossis txheej delamination.

Qhov tseem ceeb ib yam li ntawd yog lub luag haujlwm ntawm tus tuav wafer hauv kev cais tshuaj lom neeg thiab kev tswj kev ua qias tuaj. Thaum lub sijhawm SiC epitaxy, cov tuav tau raug rau cov chaw muaj hydrogen ntau thiab cov tshuaj chlorine uas muaj cov tshuaj etchants tas li. Cov ntaub ntawv ib txwm muaj lossis cov txheej txheem ua haujlwm qis dua yuav raug kev puas tsuaj los ntawm cov tshuaj lom neeg hauv qab cov xwm txheej no, ua rau muaj kev puas tsuaj ntawm qhov chaw thiab tsim cov khoom me me. Cov txheej txheem TaC ua haujlwm ua cov teeb meem diffusion thiab cov tshuaj tiv thaiv zoo heev, txo cov kev sib cuam tshuam tshuaj lom neeg ntawm tus tuav thiab cov pa roj txheej txheem thaum txo cov hlau tsis huv thiab cov khoom me me. Qhov no pab ncaj qha rau kev txhim kho chav huv, kev saib xyuas ntev dua, thiab kev txhim kho cov khoom siv.

Los ntawm kev sib koom ua ke ntawm cov txheej txheem, TaC-coated wafer chucks ua rau muaj kev rov ua dua wafer positioning, kev sib cuag ruaj khov ntawm sab nraub qaum, thiab kev sib txuas thermal tas li - txhua yam tseem ceeb rau kev ua tiav kev sib xws ntawm ib pawg mus rau ib pawg hauv kev tsim khoom ntau. Lawv lub zog kho tshuab thiab kev ruaj khov ntawm tshuaj lom neeg ua kom muaj kev ua tau zoo thoob plaws hauv cov txheej txheem ntev, txo cov sijhawm tsis tau npaj tseg thiab txo cov nqi tag nrho ntawm kev muaj.

Siv kev txawj ntse hauv cov ntaub ntawv kub thiab cov khoom siv semiconductor, Semixlab tsim thiab tsim TaC-coated wafer chucks kom tau raws li qhov xav tau ntawm cov platform SiC epitaxial siab heev. Txhua yam khoom muab qhov tseem ceeb rau cov khoom siv huv, kev sib npaug ntawm cov txheej txheem, thiab kev sib raug zoo ntawm cov txheej txheem, kom ntseeg tau tias muaj kev ua tau zoo txawm tias nyob hauv qhov chaw nyuaj tshaj plaws. Peb tos ntsoov yuav tau txais koj cov lus nug.